TUNGSTEN CMP SLURRIES FOR METAL REMOVAL

Ferro is a leading global manufacturer of optimized high-purity tungsten CMP slurries designed to deliver optimal performance in metal CMP (chemical mechanical planarization) applications.

Tungsten CMP Slurries for Metal Removal

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The Ferro tungsten CMP slurry product line offers a wide range of aqueous tungsten slurries that achieve optimal metal CMP removal rates, resulting in decreased cost of ownership with increased productivity using existing equipment and space. 
SN5000 - HIGH SELECTIVITY TUNGSTEN CMP SLURRY  
The SN5000 series is a highly selective tungsten slurry line designed with a stable particle size to reduce any variation in performance. The four times dilution ratio results in a lower cost of ownership.
ITEMS  SN5000 
Tungsten Removal Rate  4113 Å @ 4 psi
TEOS Removal Rate  79 Å @ 4 psi
DIshing @ 15% OP  455 Å
Erosion @ 15% OP  1082 Å
Edge of Erosion @ 15% OP  1260 Å
Shelf Life  12 months 
pH Value 
Dilution Ratio 4X (1 : 3) 
Recommended H2O2 3.10 % 
SN500 Tungsten CMP Slurry Stability
SN5100 - LOW/ZERO SELECTIVE TUNGSTEN BUFFING SLURRY 
The SN5100 series is a low or zero selective tungsten buffing slurry. The selectivity is tunable in order to provide the most flexibility for the CMP process. 
This formulation does not use a transitional metal catalyst which results in low residual metal ion contamination.
ITEMS  SN5100 
Tungsten Removal Rate  100~400 Å min @ 1.5 psi
TEOS Removal Rate  100~400 Å min @ 1.5 psi
Selectivity > 1. = 1. or < 1
Abrasive Colloidal Silica
pH Value 2.5
Shelf Life  12 months 
Dilution Ratio No Dilution
Feature of Slurry Non H2O2 System
No transitional metal catalyst
SN5100 Tungsten Buffing Slurry Performance-Section Analysis
SN5100 Tungsten section analysis
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With over 40 years of surface finishing experience, Ferro’s research, development and analytical resources enable us to develop unique polishes and abrasives for polishing a variety of substrates including plastic, glass, automotive clear coats, and sapphire.

Our expertise in abrasive particle development and manufacturing technology allows us to optimize the physical and chemical properties needed to deliver optimal solutions for our customers’ varied polishing applications.